MICROPROBE AUGER ANALYSIS OF SI MIGRATION IN AL METALLIZATION FOR LSI

被引：7
|
作者：
INOUE, T
HORIUCHI, S
IWAI, H
SHIMIZU, H
ISHIDA, T
机构：
[1] TOKYO SHIBAURA ELECT CO LTD,TOSHIBA RES & DEV CTR,SAIWAI KU,KAWASAKI 210,JAPAN
[2] ELECTROTECH LAB,TOKYO 188,JAPAN
[3] NIPPON ELECT VARIAN CO LTD,TOKYO 183,JAPAN
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1976年 / 15卷
关键词：
D O I：
10.7567/JJAPS.15S1.63
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：63 / 69
页数：7
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