NONMETAL EXCITATION IN HELIUM, NEON, AND ARGON MICROWAVE PLASMAS

被引：28

作者：

BAUER, CF ^{[1
]}

SKOGERBOE, RK ^{[1
]}

机构：

[1] COLORADO STATE UNIV,DEPT CHEM,FT COLLINS,CO 80523

来源：

SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY | 1983年 / 38卷 / 08期

关键词：

D O I：

10.1016/0584-8547(83)80088-3

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

引用

页码：1125 / 1134

页数：10

共 50 条

[1] Excitation probabilities for electrons in helium, neon, and argon
Van Atta, LC
PHYSICAL REVIEW, 1931, 38 (05): : 876 - 887
[2] Excitation of singly ionized argon species in helium-matrix Grimm glow discharge plasmas .2. Comparison between argon and neon
Wagatsuma, K
Hirokawa, K
FRESENIUS JOURNAL OF ANALYTICAL CHEMISTRY, 1996, 355 (7-8): : 876 - 877
[3] Ionization of helium, neon, and argon
Womer, RL
PHYSICAL REVIEW, 1931, 38 (03): : 454 - 456
[4] HELIUM, NEON AND ARGON IN THE OCEANS
KONIG, H
WANKE, H
BIEN, GS
RAKESTRAW, NW
SUESS, HE
DEEP-SEA RESEARCH, 1964, 11 (02): : 243 - 247
[5] A study of excitation mechanisms in atmospheric microwave induced argon plasmas
Timmermans, EAH
Thomas, IAJ
Jonkers, J
Van der Mullen, JAM
ADVANCED TECHNOLOGIES BASED ON WAVE AND BEAM GENERATED PLASMAS, 1999, 67 : 537 - 538
[6] ELECTRON ENERGY DISTRIBUTIONS IN PLASMAS .3. CATHODE REGIONS IN HELIUM, NEON AND ARGON
TWIDDY, ND
PROCEEDINGS OF THE ROYAL SOCIETY OF LONDON SERIES A-MATHEMATICAL AND PHYSICAL SCIENCES, 1961, 262 (1310) : 379 - +
[7] Characteristics of argon and helium plasmas created by microwave discharge at atmospheric pressure
Belmonte, T.
Cardoso, R. P.
Noel, C.
Henrion, G.
Kosior, F.
INFORMACIJE MIDEM-JOURNAL OF MICROELECTRONICS ELECTRONIC COMPONENTS AND MATERIALS, 2007, 37 (03): : 117 - 122
[8] SCATTERING OF METASTABLE HELIUM ATOMS IN HELIUM, NEON, AND ARGON
SMITH, GM
MUSCHLITZ, EE
JOURNAL OF CHEMICAL PHYSICS, 1960, 33 (06) : 1819 - 1825
[9] ANNIHILATION OF POSITRONS IN HELIUM, NEON, AND ARGON
MONTGOMERY, RE
LABAHN, RW
CANADIAN JOURNAL OF PHYSICS, 1970, 48 (11) : 1288 - +
[10] HELIUM, NEON AND ARGON .9.
YAWS, CL
HOPPER, JR
ROJAS, MG
SETTY, HSN
CHEMICAL ENGINEERING, 1975, 82 (04) : 87 - 94

← 1 2 3 4 5 →