THE EFFECT OF INCIDENCE ANGLE ON DISORDER PRODUCTION IN ION-IMPLANTED SI

被引:1
|
作者
SUKIRNO
CARTER, G
机构
来源
RADIATION EFFECTS AND DEFECTS IN SOLIDS | 1989年 / 108卷 / 2-4期
关键词
D O I
10.1080/10420158908230307
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
引用
收藏
页码:163 / 183
页数:21
相关论文
共 50 条
  • [41] ION-IMPLANTED SI MESFETS WITH HIGH CUTOFF FREQUENCY
    FERNHOLZ, G
    BENEKING, H
    IEEE TRANSACTIONS ON ELECTRON DEVICES, 1983, 30 (07) : 837 - 840
  • [42] Characterization of HF cleaning of ion-implanted Si surfaces
    Interuniversity Microelectronics, Cent, Leuven, Belgium
    Diffus Def Data Pt B, (271-274):
  • [43] SELF-ANNEALING IN ION-IMPLANTED SI AND GAAS
    KOMAROV, FF
    VACUUM, 1991, 42 (1-2) : 101 - 106
  • [44] TSC MEASUREMENTS OF COUPLED LEVELS IN ION-IMPLANTED SI
    LUDMAN, J
    ROOSILD, S
    VICKERS, V
    JOURNAL OF ELECTRONIC MATERIALS, 1978, 7 (04) : 535 - 546
  • [45] OPTICAL-ABSORPTION IN ION-IMPLANTED SI FILMS
    ZAMMIT, U
    MADHUSOODANAN, KN
    MARINELLI, M
    SCUDIERI, F
    MERCURI, F
    WENDLER, E
    WESCH, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1995, 96 (1-2): : 241 - 244
  • [46] AMORPHIZATION PROCESSES AND STRUCTURAL RELAXATION IN ION-IMPLANTED SI
    MOTOOKA, T
    KOBAYASHI, F
    HIROYAMA, Y
    TOKUYAMA, T
    WEI, L
    TANIGAWA, S
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1993, 32 (1B): : 318 - 321
  • [47] ESR STUDIES ON P+ ION-IMPLANTED SI
    HASEGAWA, S
    KONTANI, R
    SHIMIZU, T
    JAPANESE JOURNAL OF APPLIED PHYSICS, 1971, 10 (05) : 655 - &
  • [48] ION DOSE EFFECT IN SUBGAP ABSORPTION-SPECTRA OF DEFECTS IN ION-IMPLANTED GAAS AND SI
    ZAMMIT, U
    GASPARRINI, F
    MARINELLI, M
    PIZZOFERRATO, R
    AGOSTINI, A
    MERCURI, F
    JOURNAL OF APPLIED PHYSICS, 1991, 70 (11) : 7060 - 7064
  • [49] DAMAGE NUCLEATION AND ANNEALING IN MEV ION-IMPLANTED SI
    HOLLAND, OW
    ELGHOR, MK
    WHITE, CW
    APPLIED PHYSICS LETTERS, 1988, 53 (14) : 1282 - 1284
  • [50] TSC MEASUREMENTS OF COUPLED LEVELS IN ION-IMPLANTED SI
    LUDMAN, J
    ROOSILD, S
    VICKERS, V
    JOURNAL OF ELECTRONIC MATERIALS, 1977, 6 (06) : 736 - 736