X-RAY-DIFFRACTION STUDY AND ELECTRICAL CHARACTERIZATION OF BORON-IMPLANTED LOW-PRESSURE CHEMICAL VAPOR-DEPOSITED POLYCRYSTALLINE SILICON LAYERS

被引：5
|
作者：
HENDRIKS, M
DELHEZ, R
DEKEIJSER, TH
RADELAAR, S
HABRAKEN, FHPM
KUIPER, AET
BOUDEWIJN, PR
机构：
[1] DELFT UNIV TECHNOL,MET LAB,2628 AL DELFT,NETHERLANDS
[2] PHILIPS RES LABS,5600 JA EINDHOVEN,NETHERLANDS
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 10期
关键词：
D O I：
10.1063/1.333806
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：2751 / 2761
页数：11
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