FIELD EMISSION WORK FUNCTION OF URANIUM ON TUNGSTEN

被引：9

作者：

COLLINS, RA

BLOTT, BH

机构：

[1] Surface Physics, University of Southampton, Southampton, England

来源：

SURFACE SCIENCE | 1968年 / 9卷 / 01期

关键词：

D O I：

10.1016/0039-6028(68)90159-3

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Field emission microscopy has been used to study the adsorption of monolayer and submonolayer films of uranium on tungsten. Three distinct adsorption states were observed in the temperature ranges corresponding to the bulk metal α, β and γ phases. The final work functions were found to be 3.60±0.03 eV at 295 °K, 3.53±0.03 eV in the range 934-1042 °K and 3.43±0.03 eV above 1042°K. Heat treatment of various initial deposits indicated a drop in work function at 934°K and at 1042°K, these changes being irreversible under all conditions. © 1968.

引用

页码：1 / &

共 21 条

[1] EFFECT OF OXYGEN ON VAPOR PRESSURE OF URANIUM [J].