STABILITY OF OXIDES GROWN ON TANTALUM SILICIDE SURFACES

被引：20

作者：

CROS, A

TU, KN

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1986年 / 60卷 / 09期

关键词：

D O I：

10.1063/1.337699

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：3323 / 3326

页数：4

共 10 条

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[9] AUGER-ELECTRON SPECTROSCOPY AND X-RAY PHOTOELECTRON-SPECTROSCOPY STUDIES OF THE OXIDATION OF POLYCRYSTALLINE TANTALUM AND NIOBIUM AT ROOM-TEMPERATURE AND LOW OXYGEN PRESSURES [J].

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