GALVANOSTATIC PULSE PLATING OF COPPER AND COPPER(I) HALIDES FROM ACID COPPER(II) HALIDE SOLUTIONS

被引：21
|
作者：
YEOW, CW
HIBBERT, DB
机构：
来源：
JOURNAL OF THE ELECTROCHEMICAL SOCIETY | 1983年 / 130卷 / 04期
关键词：
D O I：
10.1149/1.2119804
中图分类号：
O646 [电化学、电解、磁化学];
学科分类号：
081704 ;
摘要：
引用
收藏
页码：786 / 790
页数：5
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