SURFACE STATES AT STEAM-GROWN SILICON-SILICON DIOXIDE INTERFACES

被引:626
|
作者
BERGLUND, CN
机构
关键词
D O I
10.1109/T-ED.1966.15827
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:701 / +
页数:1
相关论文
共 50 条
  • [41] DEEP-LEVEL TRANSIENT SPECTROSCOPY CHARACTERIZATION OF SILICON-SILICON INTERFACES
    STIEVENARD, D
    WALLART, X
    MATHIOT, D
    JOURNAL OF APPLIED PHYSICS, 1991, 69 (11) : 7640 - 7644
  • [42] Passivation of a (100) Silicon Surface by Silicon Dioxide Grown in Nitric Acid
    Grant, Nicholas E.
    McIntosh, Keith R.
    IEEE ELECTRON DEVICE LETTERS, 2009, 30 (09) : 922 - 924
  • [43] Traps in the Nanocomposite Layer of Silicon-Silicon Dioxide and Their Effect on the Luminescent Properties
    Dement'ev, P. A.
    Ivanova, E., V
    Zamoryanskaya, M., V
    PHYSICS OF THE SOLID STATE, 2019, 61 (08) : 1394 - 1400
  • [44] EFFECT OF O+ IMPLANTATION ON SILICON-SILICON DIOXIDE INTERFACE PROPERTIES
    SPROUL, ME
    NASSIBIAN, AG
    SOLID-STATE ELECTRONICS, 1974, 17 (06) : 577 - 582
  • [45] Unravelling the silicon-silicon dioxide interface under different operating conditions
    Nie, Shuai
    Bonilla, Ruy Sebastian
    Hameiri, Ziv
    SOLAR ENERGY MATERIALS AND SOLAR CELLS, 2021, 224
  • [46] EFFECTS OF ION-IMPLANTATION ON CHARGES IN SILICON-SILICON DIOXIDE SYSTEM
    LEARN, AJ
    HESS, DW
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (01) : 308 - 312
  • [47] LASER-SCANNING PHOTOEMISSION MEASUREMENTS OF SILICON-SILICON DIOXIDE INTERFACE
    WILLIAMS, R
    WOODS, MH
    JOURNAL OF APPLIED PHYSICS, 1972, 43 (10) : 4142 - +
  • [48] Leakage current analysis of a real world silicon-silicon dioxide capacitance
    Schwaha, P.
    Heinzl, R.
    Brezna, W.
    Smoliner, J.
    Enichlmair, H.
    Minixhofer, R.
    Grasser, T.
    PROCEEDINGS OF THE 6TH INTERNATIONAL CARIBBEAN CONFERENCE ON DEVICES, CIRCUITS, AND SYSTEMS, 2006, : 365 - +
  • [49] EFFECTS OF OXIDATION AND NITROGEN ANNEALING ON ION-IMPLANTATION-INDUCED INTERFACE STATES IN SILICON-SILICON DIOXIDE SYSTEM
    HESS, DW
    LEARN, AJ
    JOURNAL OF APPLIED PHYSICS, 1977, 48 (02) : 834 - 836
  • [50] DETERMINATION OF ALUMINUM-SILICON DIOXIDE AND SILICON-SILICON DIOXIDE BARRIER HEIGHTS IN A METAL-TUNNEL INSULATOR-SILICON SYSTEM
    DUONG, AK
    NASSIBIAN, AG
    JOURNAL OF APPLIED PHYSICS, 1985, 57 (04) : 1256 - 1260