THE INFLUENCE OF OXIDATION ON THE WETTABILITY OF ALUMINUM ON SAPPHIRE

被引：60

作者：

WANG, DJ

WU, ST

机构：

[1] NATL TSING HUA UNIV, DEPT MAT SCI & ENGN, HSINCHU 300, TAIWAN

[2] SYNCHROTRON RADIAT RES CTR, HSINCHU, TAIWAN

来源：

ACTA METALLURGICA ET MATERIALIA | 1994年 / 42卷 / 12期

关键词：

D O I：

10.1016/0956-7151(94)90180-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The contact angle of pure aluminum melt at 973 K on sapphire (0001) surface is measured by forcing a fresh aluminum droplet out of an alumina syringe into a high vacuum of 10(-4) Pa. A value of 90-degrees is obtained if oxygen contamination at liquid-solid interface is avoided by limiting the exposure time of droplet to oxidative residual gases before contacting the substrate to < 1 s. The value coincides with previous measurements by John and Hausner and also by Naidich et al. Other higher values of the contact angle are probably subjected to the influence of oxide layer on the droplet.

引用

页码：4029 / 4034

页数：6

共 18 条

[1]

Bashforth F., 1883, THEORIES CAPILLARY A

[2] EFFECT OF NATURE OF SURFACES ON WETTING OF SAPPHIRE BY LIQUID ALUMINUM [J].