IMAGING ZONE PLATES FOR X-RAY MICROSCOPY FABRICATED BY ELECTRON-BEAM LITHOGRAPHY

被引:5
作者
UNGER, P [1 ]
BOGLI, V [1 ]
BENEKING, H [1 ]
NIEMANN, B [1 ]
GUTTMANN, P [1 ]
机构
[1] UNIV GOTTINGEN,FORSCH GRP RONTGENMIKROSKOPIE,D-3400 GOTTINGEN,FED REP GER
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1988年 / 6卷 / 01期
关键词
D O I
10.1116/1.583989
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
引用
收藏
页码:323 / 327
页数:5
相关论文
共 50 条
[31]   ELECTRON X-RAY RATIOS IN AN ELECTRON-BEAM EVAPORATOR [J].
BHATTACHARYA, PK ;
REISMAN, A ;
CHEN, MC .
JOURNAL OF ELECTRONIC MATERIALS, 1987, 16 (04) :A12-A13
[32]   Phase zone plates for hard X-ray microscopy [J].
Kaulich, B .
X-RAY MICROFOCUSING: APPLICATIONS AND TECHNIQUES, 1998, 3449 :108-117
[33]   Nickel zone plates for soft X-ray microscopy [J].
Peuker, M .
X-RAY MICROSCOPY, PROCEEDINGS, 2000, 507 :682-687
[34]   X-ray mapping in electron-beam instruments [J].
Friel, JJ ;
Lyman, CE .
MICROSCOPY AND MICROANALYSIS, 2006, 12 (01) :2-25
[35]   ELECTRON-BEAM AND X-RAY RESISTS FOR MICROLITHOGRAPHY [J].
ERANIAN, A ;
BERNARD, F ;
DUBOIS, JC .
MAKROMOLEKULARE CHEMIE-MACROMOLECULAR SYMPOSIA, 1989, 24 :41-65
[36]   Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography [J].
Wang, Deqiang ;
Cao, Leifeng ;
Xie, Chang-Qing ;
Liu, Ming ;
Ye, Tian-chun .
JOURNAL OF MICROLITHOGRAPHY MICROFABRICATION AND MICROSYSTEMS, 2006, 5 (01)
[37]   MODELING OF ELECTRON-BEAM SCATTERING IN HIGH-RESOLUTION LITHOGRAPHY FOR THE FABRICATION OF X-RAY MASKS [J].
GENTILI, M ;
LUCCHESINI, A ;
SCOPA, L ;
LUGLI, P ;
PAOLETTI, A ;
MESSINA, G ;
SANTANGELO, S ;
TUCCIARONE, A .
EUROPEAN TRANSACTIONS ON TELECOMMUNICATIONS, 1990, 1 (02) :143-148
[38]   Predicting in-plane distortion from electron-beam lithography on x-ray mask membranes [J].
Laird, DL ;
Engelstad, RL ;
Puisto, DM ;
Acosta, RE ;
Cummings, KD ;
Johnson, WA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 1996, 14 (06) :4308-4313
[39]   High resolution x-ray mask fabrication by a 100 keV electron-beam lithography system [J].
Wang, L ;
Desta, YM ;
Fettig, RK ;
Goettert, J ;
Hein, H ;
Jakobs, P ;
Schulz, J .
JOURNAL OF MICROMECHANICS AND MICROENGINEERING, 2004, 14 (05) :722-726
[40]   Nanocrystal Film Patterning by Inhibiting Cation Exchange via Electron-Beam or X-ray Lithography [J].
Miszta, Karol ;
Greullet, Fanny ;
Marras, Sergio ;
Prato, Mirko ;
Toma, Andrea ;
Arciniegas, Milena ;
Manna, Liberato ;
Krahne, Roman .
NANO LETTERS, 2014, 14 (04) :2116-2122