LARGE SPONTANEOUS NUCLEATION RATE IN IMPLANTED POLYCRYSTALLINE SILICON FILMS ON SIO2

被引：10
作者：
IVERSON, RB
REIF, R
机构：
来源：
MATERIALS LETTERS | 1987年 / 5卷 / 10期
关键词：
D O I：
10.1016/0167-577X(87)90047-4
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：393 / 395
页数：3
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