OPTIMIZATION OF GD A-SI-H FILM PROPERTY FOR PHOTO-VOLTAIC DEVICE BY MEANS OF THE CROSS FIELD PLASMA DEPOSITION TECHNIQUE

被引：14
作者：
HOTTA, S
NISHIMOTO, N
TAWADA, Y
OKAMOTO, H
HAMAKAWA, Y
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1982年 / 21卷 / 01期
关键词：
D O I：
10.7567/JJAPS.21S1.289
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：289 / 295
页数：7
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