HOPPING CONDUCTION IN INSULATING RF-SPUTTERED ZINC-OXIDE FILMS

被引:79
作者
GUPTA, V
MANSINGH, A
机构
[1] Electronic Materials and Devices Laboratory, Department of Physics Astrophysics, University of Delhi
来源
PHYSICAL REVIEW B | 1994年 / 49卷 / 03期
关键词
D O I
10.1103/PhysRevB.49.1989
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The dielectric constant and ac conductivity of rf-sputtered insulating zinc oxide films has been measured in the metal-insulator-metal configuration over a wide temperature (90-500 K) and frequency (0.1-100 KHz) range. The films sputtered from oxide targets in argon were c-axis oriented having a resistivity of similar or equal to 10(12) Omega cm. The dielectric constant shows a strong frequency dispersion at temperatures above 330 K which is the intrinsic behavior of the films. The dielectric dispersion data has been fitted to (i) Debye-type relaxation (with a distribution of relaxation times), (ii) a random-free-energy-barrier model (which assumes that for hopping conduction, the dielectric dispersion is correlated to the de conductivity), and (iii) the dielectric modulus (which assumes that microscopic inhomogeneities and the distribution of conductivity relaxation times is responsible for dielectric dispersion). The origin of dielectric dispersion has been discussed in the light of these models. It has been found that hopping conduction dominates in ZnO films up to 450 K.
引用
收藏
页码:1989 / 1995
页数:7
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