ABLATION OF POLYMERS AND BIOLOGICAL TISSUE BY ULTRAVIOLET-LASERS

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] BLUM SE, 1983, Patent No. 4414059

[3] BOWKER TJ, LASERS MED SCI

[4] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[5] BRANNON JH, 1983, Patent No. 4508749

[6] BRAREN B, J POLYM SCI PL

[7] Calvert J. G., 1966, PHOTOCHEMISTRY

[8] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH [J]. APPLIED PHYSICS LETTERS, 1986, 48 (01) : 76 - 77

[9] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1986, 48 (03) : 212 - 214

[10] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01): : 27 - 30

[1] DIRECT ETCHING OF POLYMERIC MATERIALS USING A XECL LASER [J]. APPLIED PHYSICS LETTERS, 1983, 43 (08) : 717 - 719

[2] BLUM SE, 1983, Patent No. 4414059

[3] BOWKER TJ, LASERS MED SCI

[4] EXCIMER LASER ETCHING OF POLYIMIDE [J]. JOURNAL OF APPLIED PHYSICS, 1985, 58 (05) : 2036 - 2043

[5] BRANNON JH, 1983, Patent No. 4508749

[6] BRAREN B, J POLYM SCI PL

[7] Calvert J. G., 1966, PHOTOCHEMISTRY

[8] DEPENDENCE OF PHOTOETCHING RATES OF POLYMERS AT 193 NM ON OPTICAL-ABSORPTION DEPTH [J]. APPLIED PHYSICS LETTERS, 1986, 48 (01) : 76 - 77

[9] VELOCITY DISTRIBUTION OF MOLECULAR FRAGMENTS FROM POLYMETHYLMETHACRYLATE IRRADIATED WITH UV LASER-PULSES [J]. APPLIED PHYSICS LETTERS, 1986, 48 (03) : 212 - 214

[10] SPECTROSCOPIC STUDIES OF ARF LASER PHOTOABLATION OF PMMA [J]. APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING, 1985, 36 (01): : 27 - 30