ELECTRON-STATES DENSITY IN THIN COPPER-FILMS

被引：0
作者：
VOYTCHAK, L [1 ]
ROMANOVSKI, S [1 ]
STASYAK, V [1 ]
TEMKO, SV [1 ]
机构：
[1] MOSCOW GEOL EXPLORAT INST,MOSCOW,USSR
来源：
FIZIKA METALLOV I METALLOVEDENIE | 1983年 / 56卷 / 06期
关键词：
D O I：
暂无
中图分类号：
TF [冶金工业];
学科分类号：
0806 ;
摘要：
引用
收藏
页码：1056 / 1064
页数：9
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