GLOW-DISCHARGE MASS-SPECTROMETRY FOR SURFACE AND DEPTH PROFILE ANALYSIS

被引：0

作者：

KAY, E ^{[1
]}

机构：

[1] IBM CORP,RES LAB,5600 COTTLE RD,SAN JOSE,CA 95193

来源：

ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY | 1976年

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D O I：

暂无

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

引用

页码：89 / 89

页数：1

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[21] ANALYSIS OF TITANIUM-ALLOYS BY GLOW-DISCHARGE MASS-SPECTROMETRY [J].

ITOH, S ;

HIROSE, F ;

HASEGAWA, S ;

HASEGAWA, R .

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[22] RELATIVE SENSITIVITY FACTORS IN GLOW-DISCHARGE MASS-SPECTROMETRY [J].

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[24] STUDY OF THE OPTIMIZATION AND THE DEPTH PROFILE USING A FLAT TYPE ION-SOURCE IN GLOW-DISCHARGE MASS-SPECTROMETRY [J].

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MOON, DW ;

LEE, KW .

BULLETIN OF THE KOREAN CHEMICAL SOCIETY, 1992, 13 (06) :620-624

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[26] ANALYSIS OF THIN METALLIC-FILMS BY GLOW-DISCHARGE MASS-SPECTROMETRY [J].

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ANALYTICA CHIMICA ACTA, 1983, 155 (DEC) :191-198

[27] RADIOFREQUENCY GLOW-DISCHARGE ION TRAP MASS-SPECTROMETRY [J].

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GLISH, GL ;

DUCKWORTH, DC ;

MARCUS, RK .

ANALYTICAL CHEMISTRY, 1992, 64 (14) :1606-1609

[28] A GLOW-DISCHARGE MASS-SPECTROMETRY STUDY OF REACTIVE SPUTTERING [J].

HECQ, M ;

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THIN SOLID FILMS, 1981, 76 (01) :35-43

[29] GLOW-DISCHARGE MASS-SPECTROMETRY OF SPUTTERED TANTALUM NITRIDE [J].

AITA, CR ;

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LAROCCA, WJ .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :324-327

[30] REDUCTION OF SPECTRAL INTERFERENCES IN GLOW-DISCHARGE MASS-SPECTROMETRY [J].

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CLARK, J .

FRESENIUS ZEITSCHRIFT FUR ANALYTISCHE CHEMIE, 1989, 334 (07) :679-679

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