COPPER THICK-FILM SINTERING STUDIES IN AN ENVIRONMENTAL SCANNING ELECTRON-MICROSCOPE

被引:5
作者
LINK, LF
GERRISTEAD, WR
TAMHANKAR, S
机构
[1] The BOC Group, Inc, Technical Center, Murray Hill, New Jersey
关键词
ESEM; SINTERING; COPPER; THICK FILM;
D O I
10.1002/jemt.1070250524
中图分类号
R602 [外科病理学、解剖学]; R32 [人体形态学];
学科分类号
100101 ;
摘要
The significance of the ElectroScan environmental scanning electron microscope (ESEM) as a processing tool for studying dynamic morphological changes under controlled temperature/atmosphere conditions was evaluated. The ability to observe dynamic processes in situ, which cannot be achieved by other means, is critical to understanding microstructural formation. Processing of printed copper thick films on ceramics was used as a test case, wherein morphological changes associated with the steps of organic binder removal and sintering of copper particles were observed/examined in real time. Good agreement was seen between microstructures obtained in the ESEM and those achieved in a belt furnace when similar process variables were used. When processed in atmospheres which were proven to induce sintering in a conventional belt furnace, sintering was evident in both cases, and the microstructural changes were documented on videotapes in real time. Determination of critical event temperatures was achieved-that is, binder burnout occurring between 270-degrees and 350-degrees-C, onset of oxidation at 520-degrees-C, and sintering starting at 770-degrees-C. It was thus verified that the microstructural changes during the copper thick film sintering process can be observed in situ using an ESEM. (C) 1993 Wiley-Liss, Inc.
引用
收藏
页码:518 / 522
页数:5
相关论文
共 5 条
[1]  
CARMASSI S, 1987, HYBRID CIRCUIT T AUG, P23
[2]   REVIEW AND OUTLINE OF ENVIRONMENTAL SEM AT PRESENT [J].
DANILATOS, GD .
JOURNAL OF MICROSCOPY, 1991, 162 :391-402
[3]  
PRACK E, 1991, 1991 P JAP INT EL MA, P287
[4]  
Sayers P., 1989, Hybrid Circuits, P43
[5]  
TAMHANKAR SS, 1989, 3RD P INT SAMPE EL M