DETERMINATION OF TRACE IMPURITIES IN SEMICONDUCTOR-GRADE HYDROFLUORIC-ACID AND HYDROGEN-PEROXIDE BY ICP-MS

被引：0

作者：

DENOYER, ER ^{[1
]}

BRUCKNER, P ^{[1
]}

DEBRAH, E ^{[1
]}

机构：

[1] BODENSEEWERK PERKIN ELMER & CO GMBH, D-88647 UBERLINGEN, GERMANY

来源：

ATOMIC SPECTROSCOPY | 1995年 / 16卷 / 01期

关键词：

D O I：

暂无

中图分类号：

O433 [光谱学];

学科分类号：

0703 ; 070302 ;

摘要：

Application of a new ICP-MS system to the determination of trace impurities in HF and H2O2 used in semiconductor manufacture is described. Sufficient sensitivity, precision, and detection limits were achieved to perform spike recovery measurements at the 500-ng/L, 100-ng/L, and 50-ng/L test levels for a large number of elements. Accuracy and precision of the method and instrumentation used was demonstrated by means of spike recovery studies according to industry-standard methodology.

引用

页码：12 / 15

页数：4

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