EFFECTS OF SUBSTRATE-TEMPERATURE AND OXYGEN PARTIAL-PRESSURE ON THE PROPERTIES OF SPUTTERED ZIRCONIUM TITANATE THIN-FILMS

被引：4

作者：

CHANG, DA

LIN, P

TSENG, TY

机构：

[1] NATL CHIAO TUNG UNIV,INST ELECTR,HSINCHU 300,TAIWAN

[2] NATL CHIAO TUNG UNIV,INST MAT SCI & ENGN,HSINCHU 300,TAIWAN

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS | 1995年 / 34卷 / 9A期

关键词：

ZIRCONIUM TITANATE; RF MAGNETRON SPUTTERING; REFRACTIVE INDEX; EXTINCTION COEFFICIENT; CRYSTALLINITY PHASE;

D O I：

10.1143/JJAP.34.4854

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

We report the effects of substrate temperature and O-2/Ar ratios on the properties of ZrTiO4 thin films prepared by RF magnetron sputtering. The films were deposited at a constant gas pressure (0.133 Pa) with various substrate temperatures (25-450 degrees C) and different O-2/Ar ratios from 0/100 to 20/80. The deposition rate decreases with increasing oxygen partial pressure and substrate temperature. Moreover, the higher O-2 content increases the surface roughness of deposited films, which reduces the transmittance of the films. The effects of substrate temperature and oxygen partial pressure on the stoichiometric composition, optical constant, crystallinity phase, surface morphology, and adhesion have also been systematically investigated.

引用

页码：4854 / 4861

页数：8

共 40 条

[1]

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[2]

Arake K, 1980, B CHEM SOC JPN, V53, P299

[3] EFFECT OF IONIC SUBSTITUTION ON THE THERMAL-EXPANSION OF ZRTIO4 [J].