RHEED OSCILLATION STUDIES OF MBE GROWTH OF SILICON

被引:0
|
作者
SAKAMOTO, T [1 ]
SAKAMOTO, K [1 ]
MIKI, K [1 ]
KAWAMURA, T [1 ]
机构
[1] YAMANASHI UNIV, KOFU, YAMANASHI 400, JAPAN
来源
INSTITUTE OF PHYSICS CONFERENCE SERIES | 1989年 / 100期
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中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
We have used reflection high energy electron diffraction (RHEED) to investigate the step structure and initial growth mechanism during Si MBE growth. The results show the step structure strongly depends upon both the substrate annealing parameter and the misorientation of the substrate surface. An azimuthal and glancing angle dependence on the period of RHEED intensity oscillation were found, both monolayer and biatomic-layer mode oscillation being observable.
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页码:99 / 108
页数:10
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