2-PHOTON LASER-INDUCED FLUORESCENCE MONITORING OF O-ATOMS IN A PLASMA-ETCHING ENVIRONMENT

被引：61

作者：

DIMAURO, LF

GOTTSCHO, RA

MILLER, TA

机构：

来源：

JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 07期

关键词：

D O I：

10.1063/1.334242

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

收藏

页码：2007 / 2011

页数：5

相关论文

共 25 条

[1] 2-PHOTON EXCITATION OF ATOMIC OXYGEN IN A FLAME
ALDEN, M
EDNER, H
GRAFSTROM, P
SVANBERG, S
[J]. OPTICS COMMUNICATIONS, 1982, 42 (04) : 244 - 246
[2] GRID-GATED PHOTOMULTIPLIER PHOTOMETER WITH SUB-NANOSECOND TIME RESPONSE
BARISAS, BG
LEUTHER, MD
[J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 1980, 51 (01) : 74 - 78
[3] DETECTION OF FLUORESCENCE FROM O-ATOMS AND N-ATOMS INDUCED BY 2-PHOTON ABSORPTION
BISCHEL, WK
PERRY, BE
CROSLEY, DR
[J]. APPLIED OPTICS, 1982, 21 (08): : 1419 - 1429
[4] 2-PHOTON LASER-INDUCED FLUORESCENCE IN OXYGEN AND NITROGEN-ATOMS
BISCHEL, WK
PERRY, BE
CROSLEY, DR
[J]. CHEMICAL PHYSICS LETTERS, 1981, 82 (01) : 85 - 88
[5] 2-PHOTON EXCITATION OF THE N = 3 LEVEL IN H-ATOM AND D-ATOM
BOKOR, J
FREEMAN, RR
WHITE, JC
STORZ, RH
[J]. PHYSICAL REVIEW A, 1981, 24 (01): : 612 - 614
[6] 2-PHOTON INDUCED FLUORESCENCE AND RESONANCE-ENHANCED IONIZATION OF SULFUR-ATOMS
BREWER, P
VANVEEN, N
BERSOHN, R
[J]. CHEMICAL PHYSICS LETTERS, 1982, 91 (02) : 126 - 129
[7] OPTICAL-EMISSION SPECTROSCOPY OF REACTIVE PLASMAS - A METHOD FOR CORRELATING EMISSION INTENSITIES TO REACTIVE PARTICLE DENSITY
COBURN, JW
CHEN, M
[J]. JOURNAL OF APPLIED PHYSICS, 1980, 51 (06) : 3134 - 3136
[8] MECHANISMS OF ETCHING AND POLYMERIZATION IN RADIOFREQUENCY DISCHARGES OF CF4-H2,CF4-C2F4,C2F6-H2,C3F8-H2
DAGOSTINO, R
CRAMAROSSA, F
COLAPRICO, V
DETTOLE, R
[J]. JOURNAL OF APPLIED PHYSICS, 1983, 54 (03) : 1284 - 1288
[9] SPECTROSCOPIC DIAGNOSTICS OF CF4-O2 PLASMAS DURING SI AND SIO2 ETCHING PROCESSES
DAGOSTINO, R
CRAMAROSSA, F
DEBENEDICTIS, S
FERRARO, G
[J]. JOURNAL OF APPLIED PHYSICS, 1981, 52 (03) : 1259 - 1265
[10] DAGOSTINO R, 1981, PLASMA CHEM PLASMA P, V1, P365