2-PHOTON LASER-INDUCED FLUORESCENCE MONITORING OF O-ATOMS IN A PLASMA-ETCHING ENVIRONMENT

被引：61
作者：
DIMAURO, LF
GOTTSCHO, RA
MILLER, TA
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1984年 / 56卷 / 07期
关键词：
D O I：
10.1063/1.334242
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2007 / 2011
页数：5
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