ANALYSIS OF THE OXYGEN CONTAMINATION PRESENT IN SINX FILMS DEPOSITED BY ELECTRON-CYCLOTRON-RESONANCE

被引：15
作者：
GARCIA, S [1 ]
MARTIN, JM [1 ]
FERNANDEZ, M [1 ]
MARTIL, I [1 ]
GONZALEZDIAZ, G [1 ]
机构：
[1] CSIC, INST CIENCIA MAT, E-28006 MADRID, SPAIN
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A | 1995年 / 13卷 / 03期
关键词：
D O I：
10.1116/1.579835
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：826 / 830
页数：5
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