HIGH-PERFORMANCE ALGAAS/GAAS QUANTUM-WELL MODFETS GROWN BY CHEMICAL BEAM EPITAXY

被引:3
作者
KEMPTER, R
ROTHFRITZ, H
PLAUTH, J
MULLER, R
TRANKLE, G
WEIMANN, G
机构
[1] Walter-Schottky-Institut, Technische Universität München
关键词
FIELD-EFFECT TRANSISTORS; EPITAXY AND EPITAXIAL GROWTH;
D O I
10.1049/el:19920732
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
High quality modulation doped AlGaAs/GaAs QW structures were grown by chemical beam epitaxy using TEGa, TiBAl and AsH3. MODFETs with gate lengths of 0.2-mu-m fabricated from these heterostructures show extrinsic DC transconductances g(m, max) = 330 mS/mm at drain currents I(D) = 145 mA/mm. Maximum drain currents are I(Dmax) = 275 mA/mm. RF characterisation reveals extrinsic cutoff frequencies f(T) = 72 GHz for the current gain, and f(max) = 144 GHZ for the unilateral power gain, respectively.
引用
收藏
页码:1160 / 1162
页数:3
相关论文
共 5 条
[1]   THE GROWTH OF HIGH-QUALITY ALGAAS BY METALORGANIC MOLECULAR-BEAM EPITAXY [J].
HERSEE, SD ;
MARTIN, PA ;
CHIN, A ;
BALLINGALL, JM .
JOURNAL OF APPLIED PHYSICS, 1991, 70 (02) :973-976
[2]   CBE GROWTH OF ALGAAS/GAAS HETEROSTRUCTURES AND THEIR DEVICE APPLICATIONS [J].
HOUNG, YM .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :124-134
[3]   CARBON INCORPORATION IN ALGAAS GROWN BY CBE [J].
LEE, BJ ;
HOUNG, YM ;
MILLER, JN ;
TURNER, JE .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :168-177
[4]  
TRANKLE G, 1992, IN PRESS J CRYST GRO, V111
[5]   PROGRESS IN CHEMICAL BEAM EPITAXY [J].
TSANG, WT .
JOURNAL OF CRYSTAL GROWTH, 1990, 105 (1-4) :1-29