MOCVD GROWTH OF SELECTIVELY DOPED ALLNAS/GALNAS HETEROSTRUCTURES AND ITS APPLICATION TO HIFETS (HETEROINTERFACE FETS)

被引:8
作者
KAMADA, M
ISHIKAWA, H
IKEDA, M
MORI, Y
KOJIMA, C
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D O I
10.1049/el:19860786
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
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页码:1147 / 1148
页数:2
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