ATOMIC OXYGEN AND THE THERMAL-OXIDATION OF SILICON

被引：28

|

作者：

HOFF, AM

RUZYLLO, J

机构：

来源：

APPLIED PHYSICS LETTERS | 1988年 / 52卷 / 15期

关键词：

D O I：

10.1063/1.99676

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

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页码：1264 / 1265

页数：2

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