CHARACTERIZATION AND OPTIMIZATION OF A LASER GENERATED PLASMA SOURCE OF SOFT X-RAYS

被引:1
作者
ROGOYSKI, AM
CHARALAMBOUS, P
HILLS, CP
MICHETTE, AG
机构
关键词
D O I
10.1017/S0263034600003979
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:225 / 234
页数:10
相关论文
共 12 条
[1]   INVESTIGATION OF A LASER-PRODUCED PLASMA VUV LIGHT-SOURCE [J].
BRIDGES, JM ;
CROMER, CL ;
MCILRATH, TJ .
APPLIED OPTICS, 1986, 25 (13) :2208-2214
[2]   A NEW LITHOGRAPHIC TECHNIQUE FOR THE MANUFACTURE OF HIGH-RESOLUTION ZONE PLATES FOR SOFT X-RAYS [J].
BROWNE, MT ;
CHARALAMBOUS, P ;
BURGE, RE ;
DUKE, PJ ;
MICHETTE, AG ;
SIMPSON, MJ .
JOURNAL DE PHYSIQUE, 1984, 45 (NC-2) :89-92
[3]   PHOTOELECTRIC QUANTUM EFFICIENCIES AND FILTER WINDOW ABSORPTION-COEFFICIENTS FROM 20-EV TO 10-KEV [J].
DAY, RH ;
LEE, P ;
SALOMAN, EB ;
NAGEL, DJ .
JOURNAL OF APPLIED PHYSICS, 1981, 52 (11) :6965-6973
[4]   SOFT-X-RAY AND X-RAY ULTRAVIOLET-RADIATION FROM HIGH-DENSITY ALUMINUM PLASMAS [J].
DUSTON, D ;
DAVIS, J .
PHYSICAL REVIEW A, 1981, 23 (05) :2602-2621
[5]  
FEDER R, 1977, SPRINGER VERLAG SERI, V22
[6]   LASER-GENERATED PLASMA AS SOFT-X-RAY SOURCE [J].
GERRITSEN, HC ;
VANBRUG, H ;
BIJKERK, F ;
VANDERWIEL, MJ .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (07) :2337-2344
[7]   SOFT-X-RAY LITHOGRAPHY USING RADIATION FROM LASER-PRODUCED PLASMAS [J].
GOHIL, P ;
KAPOOR, H ;
MA, D ;
PEKERAR, MC ;
MCILRATH, TJ ;
GINTER, ML .
APPLIED OPTICS, 1985, 24 (13) :2024-2027
[8]  
GOHIL P, 1986, APPL OPTICS, V13, P2039
[9]  
KOMADA R, 1986, J APPL PHYS, V59, P3050
[10]   SOFT-X-RAY CONTACT MICROSCOPY USING LASER PLASMA SOURCES [J].
MICHETTE, AG ;
CHENG, PC ;
EASON, RW ;
FEDER, R ;
ONEILL, F ;
OWADANO, Y ;
ROSSER, RJ ;
RUMSBY, P ;
SHAW, MJ .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1986, 19 (03) :363-&