ENHANCEMENT OF TA+ FLUX BY SUBSTRATE BIASING DURING SPUTTER DEPOSITION OF TANTALUM NITROGEN FILMS

被引：19
作者：
AITA, CR
MYERS, TA
机构：
[1] UNIV WISCONSIN,SURFACE STUDIES LAB,MILWAUKEE,WI 53201
[2] GOULD LABS,ROLLING MEADOWS,IL 60008
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1983年 / 1卷 / 02期
关键词：
D O I：
10.1116/1.572132
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：348 / 351
页数：4
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