EPITAXIAL-GROWTH OF CADMIUM FILMS BY THE HOT-WALL TECHNIQUE

被引：5

作者：

KULKARNI, AV

BOSE, S

PRATAP, R

机构：

[1] UNIV BOMBAY,RAMNARAIN RUIA COLL,BOMBAY 400019,INDIA

[2] UNIV BOMBAY,DEPT PHYS,BOMBAY 400098,INDIA

来源：

THIN SOLID FILMS | 1984年 / 120卷 / 01期

关键词：

D O I：

10.1016/0040-6090(84)90177-9

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：L73 / L77

页数：5

共 9 条

[1]

[Anonymous], POWDER DIFFRACTION F

[2]

Bandyopadhyay S. K., 1981, Indian Journal of Physics, Part A, V55A, P270

[3] NUCLEATION AND GROWTH OF CADMIUM FILMS [J].

BANDYOPADHYAY, SK ;

PAL, AK ;

MALHOTRA, GL .

JOURNAL OF MATERIALS SCIENCE, 1979, 14 (12) :2989-2991

[4] THE HALL-EFFECT IN ALUMINUM AND CADMIUM FILMS [J].

GHOSH, CK ;

BANDYOPADHYAY, SK ;

PAL, AK .

THIN SOLID FILMS, 1981, 76 (04) :313-320

[5]

GOSWAMI A, 1969, INDIAN J PURE AP PHY, V7, P232

[6]

HALDER NC, 1979, Z NATURFORSCH A, V34, P176

[7] HOT WALL EPITAXY [J].

LOPEZOTERO, A .

THIN SOLID FILMS, 1978, 49 (01) :3-57

[8]

Maissel L.I., 1970, HDB THIN FILM TECHNO

[9] X-RAY-DIFFRACTION PROFILE ANALYSIS IN HEXAGONAL CADMIUM FILMS VACUUM-EVAPORATED FROM NORMAL AND OBLIQUE VAPOR INCIDENCE [J].

SEN, S ;

GUPTA, SPS .

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1979, 16 (01) :42-53

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