ULTRAHIGH VACUUM STATION FOR THIN FILM AND RESIDUAL GAS ANALYSIS STUDIES

被引：9
作者：
ROZGONYI, GA
POLITO, WJ
SCHWARTZ, B
机构：
来源：
VACUUM | 1966年 / 16卷 / 03期
关键词：
D O I：
10.1016/0042-207X(66)93574-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：121 / &
相关论文
共 6 条
[1]  
CASWELL HL, 1963, PHYS THIN FILMS, V1, P1
[2]  
HASS G, 1963, PHYSICS THIN FILM ED, V1, P1
[3]   SUPERCONDUCTING TANTALUM FILMS [J].
HAUSER, JJ ;
THEUERER, HC .
REVIEWS OF MODERN PHYSICS, 1964, 36 (1P1) :80-&
[4]   ADSORPTION-DESORPTION OF RESIDUAL GASES IN HIGH VACUUM [J].
LICHTMAN, D .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1965, 2 (02) :70-&
[5]   MASS PEAKS FROM ADSORBED GASES IN A SINGLE-FOCUSING MASS SPECTROMETER [J].
ROBINS, JL .
CANADIAN JOURNAL OF PHYSICS, 1963, 41 (08) :1385-&
[6]   GETTER SPUTTERING FOR PREPARATION OF THIN FILMS OF SUPERCONDUCTING ELEMENTS + COMPOUNDS [J].
THEUERER, HC ;
HAUSER, JJ .
JOURNAL OF APPLIED PHYSICS, 1964, 35 (3P1) :554-&
1