PROPERTIES OF CADMIUM STANNATE THIN-FILMS PRODUCED BY REACTIVE HIGH-RATE DC MAGNETRON-PLASMATRON SPUTTERING

被引：11

作者：

SCHILLER, S ^{[1
]}

BEISTER, G ^{[1
]}

BUEDKE, E ^{[1
]}

BECKER, HJ ^{[1
]}

SCHICHT, H ^{[1
]}

机构：

[1] VOLKSEIGENER BETRIEB FLACHGLASKOMBINAT,TORGAU,GER DEM REP

来源：

THIN SOLID FILMS | 1982年 / 96卷 / 02期

关键词：

D O I：

10.1016/0040-6090(82)90609-5

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：113 / 120

页数：8

共 11 条

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[2]

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[4]

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[5]

HEISIG U, 1981, 7TH P C HOCHV GRENZF, V2, P461

[6] DEPOSITION OF TRANSPARENT HEAT-REFLECTING COATINGS OF METAL-OXIDES USING REACTIVE PLANAR MAGNETRON SPUTTERING OF A METAL AND-OR ALLOY [J].

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RIDGE, MI .

THIN SOLID FILMS, 1981, 77 (1-3) :119-125

[7] HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY [J].

MANIV, S ;

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JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :195-198

[8] PHYSICAL-PROPERTIES OF CADMIUM-TIN OXIDE-FILMS DEPOSITED BY DC REACTIVE SPUTTERING [J].

MIYATA, N ;

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NAO, S .

THIN SOLID FILMS, 1979, 58 (02) :385-389

[9] USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J].

SCHILLER, S ;

HEISIG, U ;

GOEDICKE, K .

THIN SOLID FILMS, 1977, 40 (JAN) :327-334

[10] REACTIVE DC SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR TANTALUM PENTOXIDE AND TITANIUM-DIOXIDE FILMS [J].

SCHILLER, S ;

HEISIG, U ;

STEINFELDER, K ;

STRUMPFEL, J .

THIN SOLID FILMS, 1979, 63 (02) :369-375

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