PROPERTIES OF CADMIUM STANNATE THIN-FILMS PRODUCED BY REACTIVE HIGH-RATE DC MAGNETRON-PLASMATRON SPUTTERING

被引:11
作者
SCHILLER, S [1 ]
BEISTER, G [1 ]
BUEDKE, E [1 ]
BECKER, HJ [1 ]
SCHICHT, H [1 ]
机构
[1] VOLKSEIGENER BETRIEB FLACHGLASKOMBINAT,TORGAU,GER DEM REP
关键词
D O I
10.1016/0040-6090(82)90609-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:113 / 120
页数:8
相关论文
共 11 条
[1]   OPTICAL-ABSORPTION EDGE IN CADMIUM STANNATE SELECTIVE COATINGS [J].
AGNIHOTRI, OP ;
GUPTA, BK ;
SHARMA, AK .
JOURNAL OF APPLIED PHYSICS, 1978, 49 (08) :4540-4542
[2]  
DISLICH H, 1977, Patent No. 2755468
[3]   SPUTTER DEPOSITION AND CHARACTERIZATION OF CD2SNO4 FILMS [J].
HAACKE, G ;
MEALMAKER, WE ;
SIEGEL, LA .
THIN SOLID FILMS, 1978, 55 (01) :67-81
[4]  
HAACKE G, 1976, APPL PHYS LETT, V28, P622, DOI 10.1063/1.88589
[5]  
HEISIG U, 1981, 7TH P C HOCHV GRENZF, V2, P461
[6]   DEPOSITION OF TRANSPARENT HEAT-REFLECTING COATINGS OF METAL-OXIDES USING REACTIVE PLANAR MAGNETRON SPUTTERING OF A METAL AND-OR ALLOY [J].
HOWSON, RP ;
RIDGE, MI .
THIN SOLID FILMS, 1981, 77 (1-3) :119-125
[7]   HIGH-RATE DEPOSITION OF TRANSPARENT CONDUCTING FILMS BY MODIFIED REACTIVE PLANAR MAGNETRON SPUTTERING OF CD2SN ALLOY [J].
MANIV, S ;
MINER, C ;
WESTWOOD, WD .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY, 1981, 18 (02) :195-198
[8]   PHYSICAL-PROPERTIES OF CADMIUM-TIN OXIDE-FILMS DEPOSITED BY DC REACTIVE SPUTTERING [J].
MIYATA, N ;
MIYAKE, K ;
NAO, S .
THIN SOLID FILMS, 1979, 58 (02) :385-389
[9]   USE OF RING GAP PLASMATRON FOR HIGH-RATE SPUTTERING [J].
SCHILLER, S ;
HEISIG, U ;
GOEDICKE, K .
THIN SOLID FILMS, 1977, 40 (JAN) :327-334
[10]   REACTIVE DC SPUTTERING WITH THE MAGNETRON-PLASMATRON FOR TANTALUM PENTOXIDE AND TITANIUM-DIOXIDE FILMS [J].
SCHILLER, S ;
HEISIG, U ;
STEINFELDER, K ;
STRUMPFEL, J .
THIN SOLID FILMS, 1979, 63 (02) :369-375