FLOW PHENOMENA IN CHEMICAL VAPOR-DEPOSITION OF THIN-FILMS

被引：63
|
作者：
JENSEN, KF [1 ]
EINSET, EO [1 ]
FOTIADIS, DI [1 ]
机构：
[1] UNIV MINNESOTA, DEPT CHEM ENGN & MAT SCI, MINNEAPOLIS, MN 55455 USA
来源：
ANNUAL REVIEW OF FLUID MECHANICS | 1991年 / 23卷
关键词：
MIXED CONVECTION; DOUBLE-DIFFUSIVE PHENOMENA; THERMAL AND SOLUTAL CONVECTION; FINITE-ELEMENT FLOW SIMULATIONS; MATERIALS PROCESSING; HORIZONTAL MOCVD REACTORS; MONTE-CARLO SIMULATION; GROWTH-RATE UNIFORMITY; ROTATING-DISK; TRANSPORT PHENOMENA; MASS-TRANSFER; GAS-PHASE; DIRECTIONAL SOLIDIFICATION; THERMAL-CONVECTION; MATHEMATICAL-MODEL;
D O I：
10.1146/annurev.fluid.23.1.197
中图分类号：
O3 [力学];
学科分类号：
08 ; 0801 ;
摘要：
引用
收藏
页码：197 / 232
页数：36
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