MICROSTRUCTURAL PROPERTIES OF AMORPHOUS-SILICON ALLOYS DEPOSITED BY DC MAGNETRON SOURCE

被引：3

作者：

GRACIN, D

RADIC, N

DESNICA, UV

机构：

[1] Rudjer Bošković Institute, 41000 Zagreb

来源：

VACUUM | 1995年 / 46卷 / 8-10期

关键词：

D O I：

10.1016/0042-207X(95)00078-X

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

The a-Si : H, a-Si1-xCx : H and a-Si1-yNy : H alloys were deposited by de magnetron sputtering and their microstructural properties were examined as a function of hydrogen (5-30 at%), carbon (x = 0-0.4) and nitrogen (y = 0-0.3) content. The sample density and void volume distribution in deposited alloys were estimated by IR and NIR spectroscopy. It has been found that the fetal void volume contribution increases, the void size distribution broadens and its mean value increases as the concentration of each alloying element increases.

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页码：943 / 946

页数：4

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