RAPID THERMAL AND PULSED LASER ANNEALING OF BORON FLUORIDE-IMPLANTED SILICON

被引：45
作者：
NARAYAN, J
HOLLAND, OW
CHRISTIE, WH
WORTMAN, JJ
机构：
来源：
JOURNAL OF APPLIED PHYSICS | 1985年 / 57卷 / 08期
关键词：
D O I：
10.1063/1.335411
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
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页码：2709 / 2716
页数：8
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