NATURE OF HELICON-WAVE INSTABILITIES

被引：11
作者：
AKAI, SI
机构：
来源：
JAPANESE JOURNAL OF APPLIED PHYSICS | 1966年 / 5卷 / 12期
关键词：
D O I：
10.1143/JJAP.5.1227
中图分类号：
O59 [应用物理学];
学科分类号：
摘要：
引用
收藏
页码：1227 / &
相关论文
共 50 条
  • [31] Development of a compact nitrogen radical source by helicon-wave discharge employing a permanent magnet
    Sasaki, K
    Kokubu, H
    Hayashi, D
    Kadota, K
    THIN SOLID FILMS, 2001, 386 (02) : 243 - 247
  • [32] Oxidation of GaAs using helicon-wave excited nitrogen-oxygen-argon plasma
    Wada, S
    Kasahara, F
    Hara, A
    Ikoma, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1998, 37 (4B): : L427 - L430
  • [33] Production and application of reactive plasmas using helicon-wave discharge in very low magnetic fields
    Sato, G
    Kato, T
    Oohara, W
    Hatakeyama, R
    THIN SOLID FILMS, 2006, 506 : 550 - 554
  • [34] Damping of waves in helicon-wave range of frequency in molecular- and rare-gas plasmas
    Kikuchi, H
    Fukui, Y
    Sakawa, Y
    Shoji, T
    PHYSICS OF PLASMAS, 2003, 10 (02) : 521 - 526
  • [35] INFLUENCE OF HELICON WAVE UPON SOME ELECTROSTATIC INSTABILITIES OF PLASMAS
    TEICHMANN, J
    IVANOV, AA
    KRLIN, L
    PLASMA PHYSICS, 1971, 13 (05): : 415 - +
  • [36] Si oxynitridation with helicon-wave excited nitrogen plasma: Effects of plasma divergence and concentration on substrates
    Kimura, S
    Ito, T
    Tabakomori, M
    Okamoto, Y
    Ikoma, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1997, 36 (3B): : L316 - L319
  • [37] Si oxynitridation with Helicon-wave excited nitrogen plasma: effects of plasma divergence and concentration on substrates
    Science Univ of Tokyo, Chiba, Japan
    Jpn J Appl Phys Part 2 Letter, 3 B (L316-L319):
  • [38] Use of a helicon-wave excited plasma for aluminum-doped ZnO thin-film sputtering
    Yamaya, K
    Yamaki, Y
    Nakanishi, H
    Chichibu, S
    APPLIED PHYSICS LETTERS, 1998, 72 (02) : 235 - 237
  • [39] Use of a helicon-wave excited plasma for aluminum-doped ZnO thin-film sputtering
    Appl Phys Lett, 2 (235):
  • [40] INSTABILITIES OF A PLASMA WITH ANISOTROPIC ION TEMPERATURE PENETRATED BY FIELD OF A HELICON WAVE
    TEICHMANN, J
    CANADIAN JOURNAL OF PHYSICS, 1973, 51 (07) : 713 - 717
12345