TIME-OF-FLIGHT, ION-BEAM SURFACE-ANALYSIS FOR IN-SITU CHARACTERIZATION OF THIN-FILM GROWTH-PROCESSES

被引：23
作者：
KRAUSS, AR
AUCIELLO, O
SCHULTZ, JA
机构：
[1] MICROELECTR CTR N CAROLINA,DIV ELECTR TECHNOL,RES TRIANGLE PK,NC 27709
[2] ARGONNE NATL LAB,DIV CHEM,ARGONNE,IL 60439
[3] IBM CORP,ARMONK,NY
[4] UNIV HOUSTON,CTR SPACE VACUUM EPITAXY,HOUSTON,TX 77204
[5] USN,RES LABS,WASHINGTON,DC
[6] ARGONNE NATL LAB,DEPT ENERGY MOUND,ARGONNE,IL 60439
[7] HITACHI LTD,CENT RES LABS,TOKYO,JAPAN
[8] BEER SHEVA NUCL RES CTR,BEER SHEVA,ISRAEL
来源：
MRS BULLETIN | 1995年 / 20卷 / 05期
关键词：
D O I：
10.1557/S0883769400044845
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
[No abstract available]
引用
收藏
页码：18 / 23
页数：6
相关论文
共 33 条
[11]  
HAMMOND MS, 1995, IN PRESS J VAC SCI T
[12]  
Im J., UNPUB
[13]   COAXIAL IMPACT-COLLISION ION-SCATTERING SPECTROSCOPY (CAICISS) - A NOVEL METHOD FOR SURFACE-STRUCTURE ANALYSIS [J].
KATAYAMA, M ;
NOMURA, E ;
KANEKAMA, N ;
SOEJIMA, H ;
AONO, M .
NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1988, 33 (1-4) :857-861
[14]   ANALYSIS OF CAF2-SI(111) USING COAXIAL IMPACT - COLLISION ION-SCATTERING SPECTROSCOPY [J].
KING, BV ;
KATAYAMA, M ;
AONO, M ;
DALEY, RS ;
WILLIAMS, RS .
VACUUM, 1990, 41 (4-6) :938-940
[15]   COMPUTER-CONTROLLED ION-BEAM DEPOSITION SYSTEMS FOR HIGH-TC SUPERCONDUCTOR AND OTHER MULTICOMPONENT OXIDE THIN-FILMS AND LAYERED STRUCTURES [J].
KRAUSS, AR ;
AUCIELLO, O ;
KINGON, AI ;
AMEEN, MS ;
LIU, YL ;
BARR, T ;
GRAETTINGER, TM ;
ROU, SH ;
SOBLE, CS ;
GRUEN, DM .
APPLIED SURFACE SCIENCE, 1990, 46 (1-4) :67-73
[16]   PULSED ION-BEAM SURFACE-ANALYSIS AS A MEANS OF IN-SITU REAL-TIME ANALYSIS OF THIN-FILMS DURING GROWTH [J].
KRAUSS, AR ;
LIN, Y ;
AUCIELLO, O ;
LAMICH, GJ ;
GRUEN, DM ;
SCHULTZ, JA ;
CHANG, RPH .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (04) :1943-1957
[17]  
KRAUSS AR, 1980, MASS SPECTROMETRY 6
[18]  
KRAUSS AR, 1993, MULTICOMPONENT MULTI, P251
[19]  
LIN Y, 1995, IN PRESS THIN SOLID
[20]   STUDIES OF THIN-FILM GROWTH, ADSORPTION, AND OXIDATION BY IN-SITU, REAL-TIME, AND EX-SITU ION-BEAM ANALYSIS [J].
LIN, YP ;
KRAUSS, AR ;
AUCIELLO, O ;
NISHINO, Y ;
GRUEN, DM ;
CHANG, RPH ;
SCHULTZ, JA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 1994, 12 (04) :1557-1564
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