FABRICATION OF NANOMETER METAL STRUCTURES BY A COMBINATION OF TECHNIQUES OF METAL EVAPORATION AND E-BEAM NANOLITHOGRAPHY

被引：0
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作者：
LEE, KL
AHMED, H
机构：
来源：
IEEE ELECTRON DEVICE LETTERS | 1983年 / 4卷 / 07期
关键词：
D O I：
10.1109/EDL.1983.25719
中图分类号：
TM [电工技术]; TN [电子技术、通信技术];
学科分类号：
0808 ; 0809 ;
摘要：
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页码：243 / 245
页数：3
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