THE STICKING COEFFICIENT OF PD ON PLANAR ALUMINA SUPPORTS

被引：5

作者：

POPPA, H ^{[1
]}

FARGUES, D ^{[1
]}

KIEKEN, L ^{[1
]}

NEIMAN, D ^{[1
]}

SAVOY, R ^{[1
]}

机构：

[1] STANFORD UNIV,DEPT CHEM ENGN,STANFORD,CA 94305

来源：

VACUUM | 1990年 / 41卷 / 1-3期

基金：

美国国家航空航天局;

关键词：

D O I：

10.1016/0042-207X(90)90392-C

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Accurate sticking coefficient measurements of Pd on amorphous and single-crystal alumina supports as a function of metal exposure and support temperature are reported. Emphasis is placed on small metal exposures and some elevated temperatures, which are needed for preparing very small, spatially separated, and thermally stable supported Pd particles. A combination of AES, electron probe X-ray measurements, TEM, and Auger modelling was used to determine sticking coefficients for metal exposures between 0.1 and 1.5 monolayers (ML), at support temperatures ranging from room temperature to 850 K, and for deposition rates of 0.87, 0.74 and 0.13 ML min-1. For elevated temperatures and small metal exposures, the sticking coefficient was found to deviate substantially from unity and can be as low as 0.50 to 0.60. © 1990 Pergamon Press plc.

引用

页码：485 / 488

页数：4

共 11 条

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[2]

ICHIKAWA S, 1984, ACS ADV CHEM SERIES, P439

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