INVESTIGATION OF DIFFUSION OF BORON IN SILICON FROM A LAYER DOPED BY ION BOMBARDMENT

被引：0
作者：
PAVLOV, PV
USKOV, VA
ZORIN, EI
TETELBAU.DI
BARANOVA, AS
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SOVIET PHYSICS SOLID STATE,USSR | 1967年 / 8卷 / 09期
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中图分类号：
O469 [凝聚态物理学];
学科分类号：
070205 ;
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页码：2221 / &
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