OPTICAL MONITORING OF THE ENDPOINT IN THIN-FILM PLASMA-ETCHING

被引:12
作者
BRAGA, ES [1 ]
MENDES, GF [1 ]
FREJLICH, J [1 ]
MAMMANA, AP [1 ]
机构
[1] UNIV ESTADUAL CAMPINAS,INST FIS,OTICA LAB,BR-13100 CAMPINAS,SP,BRAZIL
关键词
D O I
10.1016/0040-6090(83)90189-X
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
引用
收藏
页码:363 / 369
页数:7
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