ULTRAVIOLET LASER-INDUCED ION EMISSION FROM SILICON

被引：20
作者：
CHEN, L
LIBERMAN, V
ONEILL, JA
WU, Z
OSGOOD, RM
机构：
来源：
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS | 1988年 / 6卷 / 03期
关键词：
D O I：
10.1116/1.575719
中图分类号：
TB3 [工程材料学];
学科分类号：
0805 ; 080502 ;
摘要：
引用
收藏
页码：1426 / 1427
页数：2
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