RESIDUAL-STRESS AND THERMAL-EXPANSION OF SPUN-ON POLYIMIDE FILMS

被引:53
作者
ELSNER, G
机构
[1] IBM Deutschland GmbH, Sindelfingen, West Ger, IBM Deutschland GmbH, Sindelfingen, West Ger
关键词
MATERIALS TESTING - Residual Stresses - PLASTICS FILMS - Thermal Expansion - STRESSES - Measurements;
D O I
10.1002/app.1987.070340231
中图分类号
O63 [高分子化学(高聚物)];
学科分类号
070305 ; 080501 ; 081704 ;
摘要
The residual stress in spin coated films and the effect of heat treatments on this stress were determined by the Fizeau interference method. Three types of spin coated polyimide (PI) films have been studied. Two of them were prepared by thermal conversion of their poly(amic acid)s (PAAs) and the third one by solvent evaporation of the soluble preimidized PI. From the stress measurement, the thermal expansion coefficient and Young's moduli have also been obtained. The thermal expansion coefficient and the Young's modulus are in the order of 9. 0 multiplied by 10** minus **6 degree C** minus **1 and 10 GPa, respectively. These values deviate from those published for bulk material which is explained by the in-plane orientation of the molecular chains in spun-on PI films.
引用
收藏
页码:815 / 828
页数:14
相关论文
共 20 条
[1]  
BATEMAN JH, 1975, COATINGS PLAST PREPR, V35, P77
[2]   AN INVESTIGATION OF THE THICKNESS VARIATION OF SPUN-ON THIN-FILMS COMMONLY ASSOCIATED WITH THE SEMICONDUCTOR INDUSTRY [J].
DAUGHTON, WJ ;
GIVENS, FL .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1982, 129 (01) :173-179
[3]  
FEIT ED, 1982, ACS S SERIES, V184
[4]   UNIFORMITY OF THIN-FILMS - NEW TECHNIQUE APPLIED TO POLYIMIDES [J].
GIVENS, FL ;
DAUGHTON, WJ .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1979, 126 (02) :269-272
[5]   MEASUREMENT OF STRESSES GENERATED IN CURED POLYIMIDE FILMS [J].
GOLDSMITH, C ;
GELDERMANS, P ;
BEDETTI, F ;
WALKER, GA .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS, 1983, 1 (02) :407-409
[6]  
Hoffman R. W., 1966, PHYS THIN FILMS, VVol. 3, pp. 211
[7]   MEASUREMENT OF STRAINS AT SI-SIO2 INTERFACE [J].
JACCODINE, RJ ;
SCHLEGEL, WA .
JOURNAL OF APPLIED PHYSICS, 1966, 37 (06) :2429-+
[8]   INTERFEROMETRIC SURFACE MAPPING WITH VARIABLE SENSITIVITY [J].
JAERISCH, W ;
MAKOSCH, G .
APPLIED OPTICS, 1978, 17 (05) :740-743
[9]  
Korth H.-E., 1983, Journal de Physique Colloque, V44, P101, DOI 10.1051/jphyscol:19831021
[10]  
LEE YK, 1982, ACS S SERIES, V184