METALLIC ALUMINUM PARTICLE CONCENTRATION IN ALUMINUM-OXIDE THIN-FILMS

被引：8

作者：

BIREY, H ^{[1
]}

机构：

[1] CEKMECE NUCL RES & TRAINING CTR PK1 HAVAALANI,PHYS DEPT,ISTANBUL,TURKEY

来源：

JOURNAL OF APPLIED PHYSICS | 1974年 / 45卷 / 09期

关键词：

D O I：

10.1063/1.1663893

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

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页码：3946 / 3948

页数：3

相关论文

共 7 条

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[2] BIREY H, 1973, APPL PHYS LETT, V23, P317
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[4] NORMAL AND SUPERCONDUCTING PROPERTIES OF METALLIC GRAINS (AL) EMBEDDED IN A SEMICONDUCTOR (GE) - EXPERIMENTAL EVIDENCE FOR AN ADDITIONAL ATTRACTIVE MECHANISM BETWEEN ELECTRONS
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[5] LOW-VOLTAGE CURRENT-VOLTAGE RELATIONSHIP OF TUNNEL JUNCTIONS
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[6] GENERALIZED FORMULA FOR ELECTRIC TUNNEL EFFECT BETWEEN SIMILAR ELECTRODES SEPARATED BY A THIN INSULATING FILM
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[J]. JOURNAL OF APPLIED PHYSICS, 1963, 34 (06) : 1793 - &
[7] Vasicek A., 1960, OPTICS THIN FILMS