THERMAL EFFECTS IN ELECTRON-BEAM LITHOGRAPHY

被引：14

作者：

MULDER, EH

VANDERMAST, KD

ENTERS, AC

机构：

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1989年 / 7卷 / 06期

关键词：

D O I：

10.1116/1.584531

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

引用

页码：1552 / 1555

页数：4

共 15 条

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[6] AN ELECTRON-BEAM LITHOGRAPHY SYSTEM FOR SUB-MICRON VHSIC DEVICE FABRICATION [J].

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[7]

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[8]

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[9]

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[10]

Reimer L, 1985, SCANNING ELECT MICRO, P57

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