GROWTH OF INN ON GAAS SUBSTRATES BY THE REACTIVE EVAPORATION METHOD

被引:13
作者
SATO, Y
SATO, S
机构
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS | 1989年 / 28卷 / 09期
关键词
D O I
10.1143/JJAP.28.L1641
中图分类号
O59 [应用物理学];
学科分类号
摘要
引用
收藏
页码:L1641 / L1643
页数:3
相关论文
共 8 条
[1]   ELECTRICAL AND OPTICAL PROPERTIES OF RF-SPUTTERED GAN AND INN [J].
HOVEL, HJ ;
CUOMO, JJ .
APPLIED PHYSICS LETTERS, 1972, 20 (02) :71-&
[2]   LIQUIDUS CALCULATIONS FOR III-N-SEMICONDUCTORS [J].
JONES, RD ;
ROSE, K .
CALPHAD-COMPUTER COUPLING OF PHASE DIAGRAMS AND THERMOCHEMISTRY, 1984, 8 (04) :343-354
[3]  
Marasina L. A., 1977, Kristall und Technik, V12, P541, DOI 10.1002/crat.19770120603
[4]   HERSTELLUNG DER NITRIDE VON BOR, ALUMINIUM, GALLIUM UND INDIUM NACH DEM AUFWACHSVERFAHREN [J].
RENNER, T .
ZEITSCHRIFT FUR ANORGANISCHE UND ALLGEMEINE CHEMIE, 1959, 298 (1-2) :22-33
[5]  
TAKAI O, 1982, 7TH P INT C VAC MET, P137
[6]  
TAKAI O, 1982, 7TH P INT C VAC MET, P129
[7]   OPTICAL BAND-GAP OF INDIUM NITRIDE [J].
TANSLEY, TL ;
FOLEY, CP .
JOURNAL OF APPLIED PHYSICS, 1986, 59 (09) :3241-3244
[8]   HETEROEPITAXIAL GROWTH OF INN BY MICROWAVE-EXCITED METALORGANIC VAPOR-PHASE EPITAXY [J].
WAKAHARA, A ;
YOSHIDA, A .
APPLIED PHYSICS LETTERS, 1989, 54 (08) :709-711