PHOTOOXIDATIVE DEGRADATION OF COPOLYMERS OF ACRYLONITRILE WITH STYRENE, ALPHA-METHYLSTYRENE AND PARA-METHYLSTYRENE

被引：5
|
作者：
BERKO, H
HILL, DJT
ODONNELL, JH
POMERY, PJ
机构：
[1] Polymer Materials and Radiation Group, Department of Chemistry, University of Queensland
来源：
POLYMER DEGRADATION AND STABILITY | 1992年 / 37卷 / 01期
关键词：
D O I：
10.1016/0141-3910(92)90096-N
中图分类号：
O63 [高分子化学（高聚物）];
学科分类号：
070305 ; 080501 ; 081704 ;
摘要：
The photo-oxidative degradation of 25-mu-m-thick films of copolymers of acrylonitrile with styrene (SAN), alpha-methylstyrene (AMS:AN) and p-methylstyrene (PMS:AN) by UV-B radiation (maximum intensity at 313 nm) resulted in the formation of conjugated unsaturation, hydroxyl and carboxyl structures, and main-chain scission and crosslinking. Oxidation increased with increasing proportion of the styrenic monomer, and in the order AMS:AN, SAN, PMS:AN. Chain scission was predominant in ASM:AN and SAN, but crosslinking was the main reaction in PMS:AN. The tensile strength and elongation to fracture of PMS:AN were relatively unaffected by high radiation doses, but decreased substantially for SAN and AMS:AN, consistently with the changes in molecular weight.
引用
收藏
页码：85 / 90
页数：6
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