EFFECT OF GROWTH TEMPERATURE ON SUPERCONDUCTING PHASES OF AS-GROWN BISRCACUO THIN-FILM FORMED BY RF MAGNETRON SPUTTERING

被引:7
|
作者
KURODA, K [1 ]
KOJIMA, K [1 ]
YOKOYAMA, K [1 ]
HAMANAKA, K [1 ]
机构
[1] MITSUBISHI ELECTR CO, MAT & ELECTR DEVICES LAB, AMAGASAKI, HYOGO 661, JAPAN
关键词
BiSrCaCuO; Crystal structure; Sputtering; Superconducting phase; Superconductor; Thin films; XRD;
D O I
10.1143/JJAP.29.L2033
中图分类号
O59 [应用物理学];
学科分类号
摘要
The effect of growth temperature on superconducting phases has been studied for BiSrCaCuO thin films grown on MgO(100) infstrates at temperatures in the range 500–660°C by RF magnetron sputtering from three targets. The chemical compositions of the metal elements of the films formed at each infstrate temperature were adjusted to Bi:(Sr+Ca):Cu=2:3:2, 2:3.5:2.5 and 2:4:3. Low-Tcphases (232 phases), 232/243 phases and high-Tcphases (243 phases) were obtained above 580°C with the 2:3:2 composition, above 590°C with the 2:3.5:2.5 composition, and above 620°C with the 2:4:3 composition. © 1990 IOP Publishing Ltd.
引用
收藏
页码:L2033 / L2036
页数:4
相关论文
共 50 条
  • [41] Effect of Applied Substrate Bias on Growth of CdTe Film by RF Magnetron Sputtering
    Li, Hui
    Liu, Xiangxin
    Huang, Fang
    2012 38TH IEEE PHOTOVOLTAIC SPECIALISTS CONFERENCE (PVSC), 2012,
  • [42] SURFACE-TEMPERATURE MEASUREMENTS DURING THIN-FILM DEPOSITION BY RF SPUTTERING
    MISIANO, C
    SIMONETTI, E
    CORSI, C
    THIN SOLID FILMS, 1975, 27 (02) : L15 - L17
  • [43] Fabrication of (Cu,C)Ba2CuOy superconducting thin film by RF magnetron sputtering
    Wakamatsu, Hiroki
    Ogata, Takafumi
    Yamaguchi, Naohiro
    Mikusu, Satoshi
    Tokiwa, Kazuyasu
    Watanabe, Tsuneo
    Ohki, Kotaro
    Kikunaga, Kazuya
    Terada, Norio
    Kikuchi, Naoto
    Tanaka, Yasumoto
    Iyo, Akira
    7TH EUROPEAN CONFERENCE ON APPLIED SUPERCONDUCTIVITY (EUCAS'05), 2006, 43 : 289 - 292
  • [44] THIN-FILM FIELD-EFFECT TRANSISTORS INCORPORATING HYDROGENATED AMORPHOUS-SILICON PRODUCED BY RF MAGNETRON SPUTTERING
    ABDULRIDA, MC
    ALLISON, J
    THIN SOLID FILMS, 1983, 102 (04) : L43 - L46
  • [45] Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering
    Mahdhi, H.
    Ben Ayadi, Z.
    Gauffier, J. L.
    Djessas, K.
    JOURNAL OF ELECTRONIC MATERIALS, 2016, 45 (01) : 557 - 565
  • [46] Influence of Substrate Temperature on the Properties of Nanostructured ZnO Thin Films Grown by RF Magnetron Sputtering
    H. Mahdhi
    Z. Ben Ayadi
    J. L. Gauffier
    K. Djessas
    Journal of Electronic Materials, 2016, 45 : 557 - 565
  • [47] Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method
    Wu, Shih-jeh Jimmy
    Houng, Boen
    Huang, Bo-sen
    JOURNAL OF ALLOYS AND COMPOUNDS, 2009, 475 (1-2) : 488 - 493
  • [48] Effect of growth and annealing temperatures on crystallization of tantalum pentoxide thin film prepared by RF magnetron sputtering method
    Wu, Shih-jeh Jimmy
    Houng, Boen
    Huang, Bo-sen
    Journal of Alloys and Compounds, 2009, 475 (1-2): : 488 - 493
  • [49] Optical properties of anatase, rutile and amorphous phases of TiO2 thin films grown at room temperature by RF magnetron sputtering
    Naik, VM
    Haddad, D
    Naik, R
    Benci, J
    Auner, GW
    SOLID-STATE CHEMISTRY OF INORGANIC MATERIALS IV, 2003, 755 : 413 - 418
  • [50] On the nucleation and growth of Zn1-xMnxO thin films grown by RF magnetron sputtering
    Gopalakrishnan, N.
    Elanchezhiyan, J.
    Bhuvana, K. P.
    Balasubramanian, T.
    SCRIPTA MATERIALIA, 2008, 58 (10) : 930 - 933