ION AND PLASMA BEAM ASSISTED THIN-FILM DEPOSITION

被引：17
|
作者：
OECHSNER, H
机构：
来源：
THIN SOLID FILMS | 1989年 / 175卷
关键词：
D O I：
10.1016/0040-6090(89)90818-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：119 / 127
页数：9
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