ION AND PLASMA BEAM ASSISTED THIN-FILM DEPOSITION

被引：17
|
作者：
OECHSNER, H
机构：
来源：
THIN SOLID FILMS | 1989年 / 175卷
关键词：
D O I：
10.1016/0040-6090(89)90818-3
中图分类号：
T [工业技术];
学科分类号：
08 ;
摘要：
引用
收藏
页码：119 / 127
页数：9
相关论文
共 50 条
  • [31] CHEMICAL AND THERMODYNAMIC INFLUENCES IN ION-BEAM-ASSISTED THIN-FILM SYNTHESIS
    ENSINGER, W
    NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1994, 84 (02): : 181 - 185
  • [32] Recent developments in equipment and application of ion beam assisted thin film deposition
    Ensinger, W.
    Enders, B.
    Emmerich, R.
    Materials and Manufacturing Processes, 1994, 9 (03) : 519 - 535
  • [33] Optical thin film deposition with O2 cluster ion beam assisted deposition
    Toyoda, N
    Yamada, I
    APPLICATION OF ACCELERATORS IN RESEARCH AND INDUSTRY, 2003, 680 : 711 - 714
  • [34] PLASMA PROCESSES IN ACTIVATED THIN-FILM DEPOSITION
    LUNK, A
    SCHMIDT, M
    CONTRIBUTIONS TO PLASMA PHYSICS, 1988, 28 (03) : 275 - 292
  • [35] Nonthermal tetravinylsilane plasma used for thin-film deposition: Plasma chemistry controls thin-film chemistry
    Cech, Vladimir
    Branecky, Martin
    PLASMA PROCESSES AND POLYMERS, 2022, 19 (04)
  • [36] ION BEAM THIN FILM DEPOSITION.
    Franks, J.
    Clay, C.S.
    Peace, G.W.
    Scanning Electron Microscopy, 1980, : 155 - 162
  • [37] THIN-FILM SUPERCONDUCTING ELEMENTS, COMPOUNDS AND ALLOYS PREPARED BY ION-BEAM DEPOSITION
    SCHMIDT, PH
    SOLID STATE COMMUNICATIONS, 1974, 14 (01) : 91 - 92
  • [38] IONIZED CLUSTER BEAM TECHNIQUE FOR THIN-FILM DEPOSITION
    TAKAGI, T
    ZEITSCHRIFT FUR PHYSIK D-ATOMS MOLECULES AND CLUSTERS, 1986, 3 (2-3): : 271 - 278
  • [39] THIN-FILM DEPOSITION BY LASER-ASSISTED EVAPORATION
    SANKUR, H
    HALL, R
    APPLIED OPTICS, 1985, 24 (20): : 3343 - 3347
  • [40] Pulsed Aerosol-Assisted Low-Pressure Plasma for Thin-Film Deposition
    Carnide, G.
    Simonnet, C.
    Parmar, D.
    Zavvou, Z.
    Klein, H.
    Conan, R.
    Pozsgay, V.
    Verdier, T.
    Villeneuve-Faure, C.
    Kahn, M. L.
    Stafford, L.
    Clergereaux, R.
    PLASMA CHEMISTRY AND PLASMA PROCESSING, 2024, 44 (03) : 1343 - 1356
12345