REACTIVE FAST-ATOM BEAM ETCHING OF GAAS USING CL2 GAS

被引：53

作者：

SHIMOKAWA, F

TANAKA, H

UENISHI, Y

SAWADA, R

机构：

来源：

关键词：

D O I：

10.1063/1.344228

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

引用

页码：2613 / 2618

页数：6

共 18 条

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