IMPLANTATION PROFILES AND SPUTTERING STUDIED BY DETECTING OPTICAL RADIATION FROM SPUTTERED PARTICLES DURING ION-BOMBARDMENT

被引：0

作者：

EMMOTH, B ^{[1
]}

BRAUN, M ^{[1
]}

PALENIUS, HP ^{[1
]}

机构：

[1] RES INST PHYS,S-10405 STOCKHOLM,SWEDEN

来源：

JOURNAL OF NUCLEAR MATERIALS | 1976年 / 63卷 / 01期

关键词：

D O I：

暂无

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

引用

页码：482 / 486

页数：5

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